Laser writer
Laser engraving technology
Scanning distance:0.65mm
Scanning mode:Raster
Accuracy: 5nm
E-Beam writer
Electronic beam engraving technology
Scanning distance:depending on the beam spot
Scanning mode:Raster & Vector
Accuracy:depending on the beam spot (approx. 25nm)

*  WUXI CHINA RESOURCES MICROELECTRONICS CO.,LTD MASK FACTORY has developed electronic beam and laser processing technologies and boasts the most advanced UV exposure machine.


WUXI CHINA RESOURCES MICROELECTRONICS CO.,LTD MASK FACTORY(CRMF)is one of the earliest professional enterprises engaged in the production of mask. It owns domestically leading and comprehensive photomask manufacturing equipment, world-class facilities, excellent processes and technologies, strict quality control and information security protection. Persisting in its concept and pursuit of “Creating the value for customers and growing with customers”, CR Micro Mask has been the preferred partner of many IC design companies and wafer manufacturers in China.  

0.18um Stepper mask or bigger
3”x5”UT mask
1:1 Array mask
Copy photomask
Professional customer service
Remote data check
Notification of engraving schedule
Data generation and format conversion